Thermal stability of HfOxNy gate dielectrics on p-GaAs substrates
- T. Das
- , C. Mahata
- , G. K. Dalapati
- , D. Z. Chi
- , G. Sutradhar
- , P. K. Bose
- , C. K. Chia
- , S. Y. Chiam
- , J. S. Pan
- , Z. Zhang
- , C. K. Maiti
- Indian Institute of Technology Kharagpur
- Agency for Science, Technology and Research, Singapore
- Jadavpur University
Research output: Contribution to journal › Article › peer-review
7
Scopus
citations