Thermodynamic properties and interfacial layer characteristics of Hf O2 thin films deposited by plasma-enhanced atomic layer deposition

  • Inhoe Kim
  • , Seoungwoo Kuk
  • , Seokhoon Kim
  • , Jinwoo Kim
  • , Hyeongtag Jeon
  • , M. H. Cho
  • , K. B. Chung

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

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