Thermodynamic properties and interfacial layer characteristics of Hf O2 thin films deposited by plasma-enhanced atomic layer deposition

Inhoe Kim, Seoungwoo Kuk, Seokhoon Kim, Jinwoo Kim, Hyeongtag Jeon, M. H. Cho, K. B. Chung

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

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