Ti-decorated graphitic-C 3 N 4 monolayer: A promising material for hydrogen storage

Weibin Zhang, Zhijun Zhang, Fuchun Zhang, Woochul Yang

Research output: Contribution to journalArticlepeer-review

81 Scopus citations

Abstract

Ti-decorated graphitic carbon nitride (g-C 3 N 4 ) monolayer as a promising material system for high-capacity hydrogen storage is proposed through density functional theory calculations. The stability and hydrogen adsorption of Ti-decorated g-C 3 N 4 is analyzed by computing the adsorption energy, the charge population, and electronic density of states. The most stable decoration site of Ti atom is the triangular N hole in g-C 3 N 4 with an adsorption energy of -7.58 eV. The large diffusion energy barrier of the adsorbed Ti atom of ∼6.00 eV prohibits the cluster formation of Ti atoms. The electric field induced by electron redistribution of Ti-adsorbed porous g-C 3 N 4 significantly enhanced hydrogen adsorption up to five H 2 molecules at each Ti atom with an average adsorption energy of -0.30 eV/H 2 . The corresponding hydrogen capacity reaches up to 9.70 wt% at 0 K. In addition, the hydrogen capacity is predicted to be 6.30 wt% at 233 K and all adsorbed H 2 are released at 393 K according to molecular dynamics simulation. Thus, the Ti-decorated g-C 3 N 4 monolayer is suggested to be a promising material for hydrogen storage suggested by the DOE for commercial applications.

Original languageEnglish
Pages (from-to)247-254
Number of pages8
JournalApplied Surface Science
Volume386
DOIs
StatePublished - 15 Nov 2016

Keywords

  • Density functional theory
  • g-C N
  • Hydrogen adsorption
  • Molecular dynamics
  • Ti-decoration

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