TiO2/GeOxNy stacked gate dielectrics for Ge-MOSFETs
- M. K. Bera
- , C. Mahata
- , A. K. Chakraborty
- , S. K. Nandi
- , Jitendra N. Tiwari
- , Jui Yi Hung
- , C. K. Maiti
- Indian Institute of Technology Kharagpur
- Durham University
- National Yang Ming Chiao Tung University
Research output: Contribution to journal › Article › peer-review
33
Scopus
citations