Variation of microstructural and optical properties in SILAR grown ZnO thin films by thermal treatment

S. Valanarasu, V. Dhanasekaran, R. Chandramohan, I. Kulandaisamy, A. Sakthivelu, T. Mahalingam

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

The influence of thermal treatment on the structural and morphological properties of the ZnO films deposited by double dip Successive ionic layer by adsorption reaction is presented. The effect of annealing temperature and time in air ambient is presented in detail. The deposited films were annealed from 200 to 400 )C in air and the structural properties were determined as a function of annealing temperature by XRD. The studies revealed that films were exhibiting preferential orientation along (002) plane. The other structural parameters like the crystallite size (D), micro strain (.), dislocation density () and stacking fault (δ) of as-deposited and annealed ZnO films were evaluated and reported. The optical properties were also studied and the band gap of the ZnO thins films varied from 3.27 to 3.04 eV with the annealing temperature. SEM studies revealed that the hexagonal shaped grains with uniformly distributed morphology in annealed ZnO thin films. It has been envisaged using EDX analysis that the near stoichiometric composition of the film can be attained by thermal treatment during which microstructural changes do occur.

Original languageEnglish
Pages (from-to)5613-5619
Number of pages7
JournalJournal of Nanoscience and Nanotechnology
Volume13
Issue number8
DOIs
StatePublished - Aug 2013

Keywords

  • Annealing Effect
  • Microstructural Studies
  • Thin Films
  • ZnO Nanorods

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